Volume 39, Issue 1 (Journal of Advanced Materials-Spring 2020)                   jame 2020, 39(1): 99-103 | Back to browse issues page


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Zarchi M, Ahangarani S. The Role of Annealing on Properties of Silicon Films Deposited By EB-PVD. jame. 2020; 39 (1) :99-103
URL: http://jame.iut.ac.ir/article-1-904-en.html
Advanced Materials & Renewable Energies Department, Iranian Research Organization for Science and Technology, Tehran, Iran. , sky_man1983@yahoo.com
Abstract:   (1267 Views)

The structural and optical properties of polycrystalline silicon films obtained on a silicon wafer by electron beam physical vapor deposition (EBPVD), were studied in this paper. These films were initially amorphous and changed to a crystalline solid phase during annealing. Annealing was performed in an inert gas atmosphere tube furnace at different temperatures. Micro-structure of the films was analyzed to know the relationship between the crystalline / amorphous composition, grain size and characteristics of the films. The results showed a decrease in roughness with increasing annealing temperature and structural density. Moreover, results of Micro-Raman spectrum showed formation and increase of silicon nanocrystals in the annealed condition when the thickness of the coating increased due to structural defects.

Full-Text [PDF 506 kb]   (218 Downloads)    
Type of Study: Research | Subject: Surface engineering and coatings
Received: 2017/04/30 | Accepted: 2020/05/31 | Published: 2020/06/22

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