تأثیر دمای آنیل بر خواص ساختاری و مغناطیسی لایه نازک نئودمیوم آهن بور

نویسندگان

دانشکده مهندسی مواد، دانشگاه صنعتی مالک اشتر، شاهین شهر، اصفهان

چکیده

در این پژوهش لایه­های نازک نئودمیوم آهن بور با لایه بافر و لایه محافظ تنگستن بر زیرلایه Si/SiO2 به­روش پراکنش امواج رادیویی مگنترونی تولید شد. سیستم ایجاد شده در دماهای 450، 500، 550، 600 و 650 سانتی‌گراد در خلاء تحت عملیات بلوری شدن قرار گرفت. آنالیزفازی لایه‌ها توسط پراش پرتو ایکس بررسی شد و وجود فاز Nd2Fe14B بدون هیچ نوع فاز ثانویه دیگری تایید شد. با استفاده از میکروسکوپ الکترونی روبشی سطح مقطع پوشش و دانه­بندی لایه­ها به­طور دقیق مورد بررسی قرار گرفت. ریخت سطح لایه­ها توسط میکروسکوپ نیروی اتمی بررسی شد. خواص مغناطیسی لایه شامل نیروی پسماندزدا، مغناطش اشباع و سطح حلقه پسماند توسط مغناطومتر ارتعاشی مورد ارزیابی قرار گرفت. نتایج به‌دست آمده نشان داد که با آنیل در دمای 400 درجه سانتی‌گراد، ساختار لایه غیربلورین است. با افزایش دمای آنیل به 550 درجه سانتی‌گراد بالاترین شدت قله به‌دست می­آید و با افزایش بیش‌تر شدت کاهش می­یابد. با افزایش دمای آنیل اندازه دانه افزایش می­یابد که بر میزان نیروی پسماندزدا موثراست. با افزایش دمای آنیل به 600 درجه سانتی‌گراد نیروی پسماندزدا عمودی افزایش می­یابد و با ازدیاد بیش‌تر دمای آنیل مقدار این متغیر به­علت افزایش بیش از حد اندازه دانه­ها کاهش می­یابد. با توجه به خواص مغناطیسی و ساختاری لایه­ها می­توان نتیجه گرفت که لایه آنیل شده در دمای 600 درجه سانتی‌گراد دارای دلخواه­ترین خواص مغناطیسی و ساختاری است.

کلیدواژه‌ها


عنوان مقاله [English]

The Role of Annealing Temperature on Structural and Magnetic Properties of NdFeB Thin Films

نویسندگان [English]

  • A. Khanjani
  • A. Ghasemi
  • M. Hadi
Department of Materials Engineering, Malek Ashtar University of Technology, Shahin Shahr, Iran
چکیده [English]

In the present research NdFeB thin films coupled with buffer and capping layer of W were formed on Si/SiO2 substrate by means of RF magnetron sputtering. The system was annealed at vaccum at different temperatures of 450, 500, 550,. 600 and 650 °C Phase analysis was carried out by XRD and it was found that NdFeB was formed without the formation of any kind of secondary phase. The cross sectional and grain size of the thin films were measured by scanning electron microscopy. Morphological studies were performed by atomic force microscopy. Magnetic properties of thin films including coercivity, saturation of magnetization and hysteresis area were evcaluated by vibrating sample magnetometer. It was found that by annealing at 400 °C the amorphous layer was formed.The highest intensity of peaks was formed at 550 °C and with an increase in temperature the intensity was declined. The grain size was increased by temperature and had an impact on the coercivity. With an increase of temperature up to 600 °C, perpendicular coercivity was increased and then by further increase of temperatute, coercivity was reduced. Based on the obtained data the temperature of 600 °C was selected as the optimum annealing temperature for reaching enhanced structural and magnetic feature.

کلیدواژه‌ها [English]

  • thin film
  • NdFeB
  • coercivity
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