مطالعه تحولات ساختاری لایه نازک کربن آمورف انباشت شده بر آلیاژ نیکل- مس با تغییر دمای انباشت و انرژی پرتوی یون

نویسندگان

1 پژوهشکده کاربرد پرتوها، پژوهشگاه علوم و فنون هسته‌ای، 836-14395، تهران، ایران

2 پژوهشکده مواد پیشرفته و انرژی‌های نو، سازمان پژوهش‌های علمی و صنعتی ایران، 33535111، تهران، ایران

3 پژوهشکده فیزیک و شتابگرها، پژوهشگاه علوم و فنون هسته‌ای، 836-14395‌، تهران، ایران

چکیده

در تحقیق حاضر لایه نازک کربن آمورف با استفاده از روش کندوپاش پرتوی یونی بر شیشه و آلیاژ نیکل- مس ایجاد و همبستگی تحولات ساختاری کربن آمورف با انرژی جنبشی اتم‌های کربن در مرحله تشکیل پیوند با اتم‌های دیگر بررسی شده است. تأثیر جنس زیرلایه، دمای انباشت و انرژی پرتوی یون بر تحولات ساختاری لایه‌های انباشت شده نیز بررسی شده است. نتایج بررسی طیف‏‌سنجی رامان نشان‌دهنده تحولات ساختاری لایه نازک کربن آمورف به‌سمت کربن شبه الماسی (DLC) با افزایش دمای انباشت تا 100 درجه سانتی‌گراد و انرژی پرتوی یون از دو به پنج کیلوالکترون ولت است. اندازه خوشه‌های گرافیتی با پیوند sp 2 کوچک‌تر از یک نانومتر در لایه‌‏های کربن آمورف انباشت شده بر آلیاژ نیکل- مس است. نتایج محاسبه تنش پسماند با استفاده از دستگاه پراش پرتوی ایکس (XRD) نشان‏‌دهنده روند کاهشی میزان تنش پسماند کششی لایه نازک کربن آمورف با افزایش انرژی پرتوی یون است. 

کلیدواژه‌ها

عنوان مقاله [English]

STUDY OF STRUCTURAL EVOLUTION OF AMORPHOUS CARBON FILMS ON Ni-Cu ALLOY AND ITS CORRELATION WITH DEPOSITION TEMPERATURE AND ION BEAM ENERGY

نویسندگان [English]

  • E. Mohagheghpour 1
  • R. Gholamipour 2
  • M. Rajabi 2
  • M. Mojtahedzadeh Larijani 3
1 Radiation Applications Research School, Nuclear Sciences and Technology Research Institute, 14395836, Tehran, Iran
2 Department of Advanced Materials and Renewable Energy, Iranian Research Organization for Science and Technology (IROST), 33535111, Tehran, Iran
3 Physics and Accelerators Research school, Nuclear Sciences and Technology Research Institute, 14395836, Tehran, Iran
چکیده [English]

In this study, the amorphous carbon thin films were deposited by ion beam sputtering deposition method on the glass and Ni–Cu alloy substrates. The structural evolution of amorphous carbon and its correlation with the kinetic energy of carbon atoms during the growth of thin film was investigated. The effect of substrate material, deposition temperature, and ion beam energy on the structural changes were examined. Raman spectroscopy indicated a structural transition from amorphous carbon to diamond-like amorphous carbon (DLC) due to an increase in deposition temperature up to 100°C and ion beam energy from 2 keV to 5 keV. The size of graphite crystallites with sp < sup>2 bonds (La) were smaller than 1 nm in the amorphous carbon layers deposited on Ni-Cu alloy. The results of residual stress calculation using X-ray diffractometer (XRD) analysis revealed a decreasing trend in the tensile residual stress values of the amorphous carbon thin films with increasing the ion beam energy.

کلیدواژه‌ها [English]

  • thin film
  • Amorphous Carbon
  • Ion Beam Energy
  • Deposition Temperature
  • Structural Evolution

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مواد پیشرفته در مهندسی
دوره 40، شماره 3
آبان 1400
صفحه 29-42

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